Company Filing History:
Years Active: 2018-2019
Title: Patrick Regnier: Innovator in Photolithography Technology
Introduction
Patrick Regnier is a notable inventor based in Rians, France. He has made significant contributions to the field of photolithography, particularly in the development of methods for creating photolithography masks. With a total of 2 patents to his name, Regnier's work has implications for the manufacturing of integrated circuits.
Latest Patents
Regnier's latest patents focus on a method for making a photolithography mask intended for the formation of contacts. This method is crucial for the creation of electrically conducting contact pads between metallization levels and active zones of integrated circuits on semiconductor wafers. The process involves forming a first mask region with opening zones for contact pads, where the degree of opening is below a certain threshold. Additionally, a second mask region is created with further opening zones, ensuring that the overall degree of opening meets or exceeds the threshold.
Career Highlights
Patrick Regnier is currently employed at STMicroelectronics (Rousset) SAS, where he continues to innovate in the field of semiconductor technology. His work at this leading company allows him to collaborate with other experts in the industry and contribute to advancements in integrated circuit manufacturing.
Collaborations
Regnier has worked alongside Guilhem Bouton, a fellow innovator in the field. Their collaboration has likely fostered the exchange of ideas and techniques that enhance their respective contributions to photolithography.
Conclusion
Patrick Regnier's work in photolithography represents a significant advancement in the manufacturing of integrated circuits. His innovative methods and collaboration with industry peers continue to shape the future of semiconductor technology.