This inventor holds 1 USPTO granted patent. Top assignee: Regents of the University of Minnesota. Active years: 2019.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2019
Title: The Innovative Contributions of Patrick Quarterman
Introduction
Patrick Quarterman is a notable inventor based in Minneapolis, MN (US). He has made significant contributions to the field of magnetic media through his innovative patent. His work reflects a deep understanding of material science and engineering.
Latest Patents
Patrick Quarterman holds a patent for an "Embedded mask patterning process for fabricating magnetic media and other structures." This patent describes a method that includes depositing a functional layer over a substrate, followed by a granular layer that consists of a first material defining a plurality of grains separated by a second material. The process involves removing the second material to create a hard mask layer on the functional layer. Subsequently, portions of the functional layer that are not masked by the hard mask layer are removed using reactive ion etching with a carrier gas that has an atomic number less than that of argon. This innovative approach has the potential to enhance the fabrication of magnetic media and other structures.
Career Highlights
Patrick Quarterman is affiliated with the Regents of the University of Minnesota, where he contributes to research and development in his field. His work has garnered attention for its practical applications and innovative techniques.
Collaborations
Throughout his career, Patrick has collaborated with esteemed colleagues such as Jian-Ping Wang and Jianxin Zhu. These collaborations have further enriched his research and contributed to advancements in technology.
Conclusion
Patrick Quarterman exemplifies the spirit of innovation through his patent and contributions to the field of magnetic media. His work not only showcases his expertise but also highlights the importance of collaboration in advancing technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
