Company Filing History:
Years Active: 2012
Title: Unveiling the Innovations of Patrick Charles Maria Melis
Introduction: Patrick Charles Maria Melis, an inventor based in Liempde, Netherlands, has made significant strides in the field of lithographic processing. With one patent to his name, his work has been instrumental in advancing inspection methods and apparatus within the industry.
Latest Patents: Patrick Charles Maria Melis' groundbreaking patent titled "Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method" revolutionizes the scatterometric method. By incorporating a model with a surface layer featuring a variable parameter linked to its refractive index, a roughness value can be accurately determined.
Career Highlights: Patrick Charles Maria Melis is affiliated with ASML Netherlands B.V., a prominent company at the forefront of technological innovation in the Netherlands. Through his role at ASML, he has contributed significantly to the development of cutting-edge lithographic technologies that drive the industry forward.
Collaborations: Alongside esteemed colleagues such as Antoine Gaston Marie Kiers and Theodorus Lambertus Marinus Der Kinderen, Patrick Charles Maria Melis has engaged in collaborative efforts to enhance inspection methods and lithographic processes. Their combined expertise and shared dedication to innovation have led to groundbreaking advancements in the field.
Conclusion: In conclusion, Patrick Charles Maria Melis stands as a testament to the power of innovation and ingenuity in the realm of lithographic processing. His patent and contributions alongside his talented coworkers underscore a commitment to pushing the boundaries of technological possibility, ultimately shaping the future of the industry.