The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 31, 2012
Filed:
Oct. 13, 2006
Applicants:
Antoine Gaston Marie Kiers, Veldhoven, NL;
Theodorus Lambertus Marinus Der Kinderen, Valkenswaard, NL;
Vidya Vaenkatesan, Eindhoven, NL;
Patrick Charles Maria Melis, Liempde, NL;
Inventors:
Antoine Gaston Marie Kiers, Veldhoven, NL;
Theodorus Lambertus Marinus Der Kinderen, Valkenswaard, NL;
Vidya Vaenkatesan, Eindhoven, NL;
Patrick Charles Maria Melis, Liempde, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 11/30 (2006.01);
U.S. Cl.
CPC ...
Abstract
In a scatterometric method, a roughness value can be obtained by using a model including a surface layer having a variable parameter relating to its refractive index.