Location History:
- Elk River, MN (US) (2009 - 2013)
- Zimmerman, MN (US) (2014)
Company Filing History:
Years Active: 2009-2014
Title: Patricia Ann Ruether: Innovator in Substrate Material Removal
Introduction
Patricia Ann Ruether is a notable inventor based in Elk River, MN (US). She has made significant contributions to the field of material removal processes, particularly in the semiconductor industry. With a total of 3 patents to her name, her work has had a substantial impact on the efficiency and effectiveness of substrate treatment.
Latest Patents
One of her latest patents is titled "Process for removing material from substrates." This innovative method involves dispensing a liquid sulfuric acid composition onto a material-coated substrate. The composition is designed to effectively remove materials, such as photoresist, by utilizing a specific water/sulfuric acid molar ratio. The substrate is heated to a temperature of at least about 90° C., either before, during, or after the application of the liquid composition. Following this, the composition is exposed to water vapor, which increases its temperature, enhancing the removal process. The substrate is then rinsed to eliminate the material.
Another significant patent is "Apparatus for removing material from one or more substrates." This patent outlines a similar method of utilizing a liquid sulfuric acid composition to achieve effective material removal. The process emphasizes the importance of temperature control and the exposure to water vapor to optimize the removal of unwanted materials from substrates.
Career Highlights
Throughout her career, Patricia has worked with prominent companies such as Tel Fsi, Inc. and FSI International, Inc. Her experience in these organizations has allowed her to refine her expertise in substrate material removal technologies.
Collaborations
Patricia has collaborated with notable professionals in her field, including Kurt Karl Christenson and Ronald J. Hanestad. These collaborations have contributed to her innovative approaches and advancements in substrate treatment processes.
Conclusion
Patricia Ann Ruether is a distinguished inventor whose work in substrate material removal has paved the way for advancements in the semiconductor industry. Her innovative patents and career achievements reflect her dedication to improving material processing techniques.