This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Az Electronic Materials USA Corp.. Active years: 2006.
Company Filing History:
Years Active: 2006
Title: The Innovations of Patrice Beaud
Introduction
Patrice Beaud is a notable inventor based in Lausanne, Switzerland. He has made significant contributions to the field of microelectronics, particularly in the area of chemical-mechanical polishing. His innovative work has led to the development of a unique patent that addresses the needs of the semiconductor industry.
Latest Patents
Patrice Beaud holds a patent for a "Process for chemical-mechanical polishing of metal substrates." This invention involves an abrasive composition designed for the chemical-mechanical polishing in one stage of substrates used in the microelectronics semiconductors industry. The composition includes an acid aqueous suspension of individualized particles of colloidal silica, which are not linked to each other by siloxane bonds. The mean particle diameter of these particles ranges between 5 and 20 nm, and the composition also contains an oxidizing agent. This innovative process enhances the efficiency and effectiveness of polishing metal substrates that contain at least one metal layer and one insulator layer.
Career Highlights
Patrice Beaud is currently associated with Az Electronic Materials USA Corp., where he continues to advance his research and development efforts. His work has been instrumental in improving the processes used in the semiconductor industry, showcasing his expertise and commitment to innovation.
Collaborations
Throughout his career, Patrice has collaborated with esteemed colleagues such as Didier Bouvet and Eric Jacquinot. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and the advancement of technology in their field.
Conclusion
Patrice Beaud's contributions to the field of microelectronics through his innovative patent demonstrate his expertise and dedication to advancing technology. His work not only enhances the efficiency of chemical-mechanical polishing processes but also reflects the importance of collaboration in driving innovation forward.