Munich, Germany

Pascal Wolff

This inventor holds 1 USPTO granted patent. Top assignee: Rohde and Schwarz Gmbh & Co. Kg. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Pascal Wolff. Retrieved from https://idiyas.com/inventor/pascal-wolff

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: The Innovations of Pascal Wolff

Introduction

Pascal Wolff is an accomplished inventor based in Munich, Germany. He has made significant contributions to the field of spurious emission measurement, showcasing his expertise through his innovative patent. His work is particularly relevant in the context of ensuring the reliability and accuracy of devices under test.

Latest Patents

Pascal Wolff holds a patent titled "Method of determining a setting for performing a spurious emission measurement and method of performing a spurious emission measurement." This patent outlines a method for determining settings necessary for conducting spurious emission measurements of devices under test. The process involves performing a preliminary total radiated power (TRP) measurement along a three-dimensional measurement grid, which includes several measurement points. During this measurement, equivalent isotropic radiated power (EIRP) values are determined and evaluated against a threshold value to identify subsets of these values. This innovative approach enhances the accuracy of spurious emission measurements.

Career Highlights

Pascal Wolff is associated with Rohde & Schwarz GmbH & Co. KG, a leading company in the field of electronic test and measurement. His work at this esteemed organization has allowed him to develop and refine his innovative methods, contributing to advancements in measurement technology.

Collaborations

Pascal collaborates with Benjamin Haehlke, a fellow professional in the field. Their partnership exemplifies the collaborative spirit that drives innovation in technology and measurement.

Conclusion

Pascal Wolff's contributions to the field of spurious emission measurement through his patent demonstrate his commitment to innovation and excellence. His work not only enhances measurement accuracy but also reflects the importance of collaboration in advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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