Houston, TX, United States of America

Pascal Ponard

This inventor holds 1 USPTO granted patent. Top assignee: Visuray Intech Ltd (Bvi). Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Pascal Ponard. Retrieved from https://idiyas.com/inventor/pascal-ponard-muwosja8

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Pascal Ponard

Introduction

Pascal Ponard is a notable inventor based in Houston, TX (US). He has made significant contributions to the field of x-ray technology, particularly through his innovative patent that addresses the design of x-ray tubes. His work is essential for advancements in medical imaging and other applications.

Latest Patents

Pascal Ponard holds a patent titled "Method for reducing the diameter of a x-ray tube through recessing of the vacuum port." This patent provides methods and means for reducing the overall diameter of an x-ray tube by recessing the vacuum pumping port stub within the ground plane of the x-ray tube. This design does not adversely affect the electrostatic fields within the vacuum tube itself. In one embodiment, the smaller diameter x-ray tubes can be utilized within the highly confined diameters typically found within the pressure housings of borehole tools.

Career Highlights

Pascal Ponard is associated with Visuray Intech Ltd, a company that focuses on innovative solutions in the field of imaging technology. His work at the company has been instrumental in developing advanced x-ray systems that cater to various industrial and medical needs.

Conclusion

Pascal Ponard's contributions to x-ray technology through his innovative patent demonstrate his commitment to advancing the field. His work not only enhances the functionality of x-ray tubes but also opens new avenues for their application in confined spaces.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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