Sassenage, France

Pascal Boulitreau

This inventor holds 1 USPTO granted patent. Top assignee: Commissariat a L'energie Atomique Et Aux Energies Alternatives. Active years: 2014.


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 50(Granted Patents)


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Pascal Boulitreau

Introduction

Pascal Boulitreau is a notable inventor based in Sassenage, France. He has made significant contributions to the field of lithography, particularly through his innovative methods and devices. His work has implications for various industries, including semiconductor manufacturing.

Latest Patents

Pascal Boulitreau holds a patent for a lithography method and device. This invention involves an installation and method for etching at least one wafer coated with an etch-ready, blank photosensitive layer. The patent describes a process where the wafer, which may have thickness irregularities, is arranged to be submitted to irradiation-beam scanning. A sheet transparent to the radiation to which the photosensitive layer is sensitive covers the wafer. Additionally, a probe beam is provided to reflect on the upper portion of the sheet perpendicularly to the irradiation beam spot on the photosensitive layer.

Career Highlights

Boulitreau is associated with the Commissariat à l'énergie atomique et aux énergies alternatives, a prominent research institution in France. His work there has allowed him to explore advanced technologies in lithography and etching processes. His innovative approach has led to the development of methods that enhance the efficiency and precision of wafer processing.

Collaborations

Throughout his career, Pascal Boulitreau has collaborated with several talented individuals, including Christophe Martinez and Fabien Laulagnet. These collaborations have fostered a creative environment that encourages the exchange of ideas and advancements in technology.

Conclusion

Pascal Boulitreau's contributions to lithography and wafer processing demonstrate his innovative spirit and commitment to advancing technology. His patent reflects a significant step forward in the field, showcasing the importance of research and collaboration in driving innovation.

Profile summary based on public USPTO records.
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