Pao-Chu Chang

Title: Pao-Chu Chang: Innovator in Semiconductor Fabrication

Introduction

Pao-Chu Chang is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor fabrication, holding 2 patents that showcase his innovative techniques and methodologies.

Latest Patents

One of his latest patents is titled "Method of Fabricating Capacitor Structure." This method involves several steps, starting with the provision of a substrate. A first conductive layer, a first insulation layer, a second conductive layer, and a second insulation layer are sequentially formed over the substrate. A hard mask material layer is then created on the second insulation layer. The hard mask is defined using a photo resist pattern, allowing for the formation of the first electrode of the capacitor structure after the photo resist pattern is removed.

Another significant patent is "Deep Trench Bottle-Shaped Etch in Centura Mark II NG." This method fabricates bottle-shaped deep trenches in a semiconductor substrate through two substitute plasma etching steps. The process involves maintaining the plasma gas pressure constant before decreasing it substantially, while simultaneously increasing the concentrations of HBr and NF3. The first substitute plasma etching step is conducted at a pressure of 100 mtorr with an RF power of about 1,000 W, while the second step is at a plasma gas pressure of 30 mtorr with an RF power of 600 W.

Career Highlights

Pao-Chu Chang has worked with several prominent companies in the semiconductor industry, including Promos Technology, Inc. and Mosel Vitelic Corporation. His experience in these organizations has contributed to his expertise in semiconductor fabrication techniques.

Collaborations

Throughout his career, Pao-Chu has collaborated with notable colleagues such as Lin Ming Hung and Nien-Yu Tsai. These collaborations have likely enriched his work and contributed to the advancements in his field.

Conclusion

Pao-Chu Chang is a distinguished inventor whose work in semiconductor fabrication has led to innovative methods that enhance the efficiency and effectiveness of capacitor structures and trench etching processes. His contributions continue to impact the industry positively.