Pao-Chia Pan

Title: Pao-Chia Pan: Innovator in Chemical Mechanical Planarization

Introduction

Pao-Chia Pan is a notable inventor based in Tempe, AZ (US). He has made significant contributions to the field of chemical mechanical planarization (CMP), particularly in applications involving copper and through-silica vias (TSV). His innovative work has led to the development of advanced CMP formulations that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Pao-Chia Pan holds a patent for a CMP composition and methods for copper and TSV applications. This patent provides formulations that offer high and tunable copper removal rates while minimizing copper dishing. The CMP compositions demonstrate high selectivity of copper film compared to other barrier layers, such as tantalum (Ta), tantalum nitride (TaN), titanium (Ti), and titanium nitride (TiN), as well as dielectric films like TEOS, low-k, and ultra low-k films. The formulations include a combination of solvents, abrasives, and at least three chelators, which are selected from amino acids, amino acid derivatives, and organic amines. Additionally, the formulations incorporate organic quaternary ammonium salts, corrosion inhibitors, oxidizers, pH adjustors, and biocides.

Career Highlights

Pao-Chia Pan is currently employed at Versum Materials US, LLC, where he continues to advance his research and development efforts in CMP technologies. His work has been instrumental in improving the performance of semiconductor manufacturing processes, making him a valuable asset to his company and the industry.

Collaborations

Pao-Chia has collaborated with notable colleagues, including Xiaobo Shi and Laura M Matz. These collaborations have fostered innovation and contributed to the success of various projects within the field of chemical mechanical planarization.

Conclusion

Pao-Chia Pan's contributions to the field of chemical mechanical planarization have established him as a key inventor in semiconductor technology. His innovative CMP formulations are paving the way for advancements in manufacturing processes, showcasing the importance of his work in the industry.