Hong Kong, China

Pak Kin Leung

This inventor holds 1 USPTO granted patent. Top assignee: Asmpt Singapore Pte. Ltd.. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Pak Kin Leung. Retrieved from https://idiyas.com/inventor/pak-kin-leung-k4m259cz

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: The Innovations of Pak Kin Leung

Introduction

Pak Kin Leung is a notable inventor based in Hong Kong, CN. He has made significant contributions to the field of semiconductor technology. His work primarily focuses on enhancing the efficiency and effectiveness of die bonding processes.

Latest Patents

Pak Kin Leung holds a patent for a "Die bond head apparatus with die holder motion table." This innovative apparatus features a die bond head body that is coupled to a die bond head motion table. It also includes a die holder motion table mounted on the die bond head body, which allows for the secure placement of a semiconductor die onto a substrate. The design enables the die holder to be positioned independently of the die bond head motion table, enhancing operational flexibility.

Career Highlights

Pak Kin Leung is currently employed at Asmpt Singapore Pte. Ltd., where he continues to develop cutting-edge technologies in the semiconductor industry. His expertise and innovative mindset have made him a valuable asset to his team.

Collaborations

Pak Kin Leung has collaborated with various professionals in his field, including his coworker Chung Sheung Yung. Their combined efforts contribute to the advancement of semiconductor technologies.

Conclusion

Pak Kin Leung's contributions to the semiconductor industry through his innovative patent and collaborative efforts highlight his role as a significant inventor. His work continues to influence the field positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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