Company Filing History:
Years Active: 2025
Title: Özer Duman: Innovator in Lithographic Technology
Introduction
Özer Duman is a notable inventor based in Eindhoven, Netherlands. He has made significant contributions to the field of lithographic technology, particularly through his innovative patent.
Latest Patents
Özer Duman holds a patent titled "Method of determining a mark measurement sequence, stage apparatus and lithographic apparatus." This patent describes a method for determining a mark measurement sequence for an object that includes multiple marks. The method involves receiving location data for the marks to be measured, obtaining a boundary model of a positioning device used for the measurement, and determining the mark measurement sequence based on the location data and boundary model.
Career Highlights
Duman is associated with ASML Netherlands B.V., a leading company in the development of advanced lithography systems for the semiconductor industry. His work at ASML has positioned him as a key player in the innovation of lithographic processes.
Collaborations
Özer Duman has collaborated with notable colleagues, including István Nagy and Arjan Gijsbertsen. Their combined expertise contributes to the advancement of technology in their field.
Conclusion
Özer Duman's contributions to lithographic technology through his patent and work at ASML highlight his role as an influential inventor in the industry. His innovative methods continue to shape the future of semiconductor manufacturing.