Saint-Petersburg, Russia

Ovchinnikov Andrei

This inventor holds 1 USPTO granted patent. Top assignee: Intel Corporation. Active years: 2017.


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2017

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Ovchinnikov Andrei: Innovator in Forward Error Correction Technology

Introduction

Ovchinnikov Andrei is a notable inventor based in Saint-Petersburg, Russia. He has made significant contributions to the field of electrical engineering, particularly in the area of forward error correction technology. His innovative work has led to the development of a patent that enhances the reliability of data transmission.

Latest Patents

Andrei holds a patent for "Techniques to perform forward error correction for an electrical backplane." This invention provides a media-independent interface and circuitry of a forward error correction (FEC) sublayer. The circuitry is designed to perform forward error correction, with the FEC sublayer coupled to a physical coding sublayer and a physical medium attachment (PMA) sublayer. The FEC sublayer includes an encoder with a reverse gearbox, a compressor, a selector, a parity generator, a multiplexer, a scrambler, and a pseudo-noise generator.

Career Highlights

Andrei is currently employed at Intel Corporation, where he continues to innovate and contribute to advancements in technology. His work at Intel has allowed him to collaborate with other talented engineers and researchers in the field.

Collaborations

Some of Andrei's coworkers include Ilango S Ganga and Luke L Chang. Their collaborative efforts contribute to the development of cutting-edge technologies in the industry.

Conclusion

Ovchinnikov Andrei's contributions to forward error correction technology exemplify his dedication to innovation in electrical engineering. His patent and work at Intel Corporation highlight his role as a significant inventor in the field.

Profile summary based on public USPTO records.
Please report any incorrect information to [email protected]
Loading…