This inventor holds 3 USPTO granted patents. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2011-2013.
Company Filing History:
Years Active: 2011-2013
Title: Ouyang Hui: Innovator in Semiconductor Technology
Introduction
Ouyang Hui is a prominent inventor based in Chubei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on innovative methods for fabricating gate structures and controlling gate thickness in FinFET devices.
Latest Patents
Ouyang's latest patents include a method for fabricating a gate structure. This method involves sequentially depositing and patterning a dummy oxide layer and a dummy gate electrode layer on a substrate. It also includes surrounding these layers with a nitrogen-containing dielectric layer and an interlayer dielectric layer. The process continues with the removal of the dummy gate electrode layer and the dummy oxide layer, followed by the deposition of a gate dielectric and a gate electrode.
Another notable patent is a method of controlling gate thickness in forming FinFET devices. In this method, a fin is formed on a substrate, and a gate structure is created over the fin. The gate structure consists of a dielectric layer and a conformal first polysilicon layer. The process includes the formation of an etch stop layer and a second polysilicon layer, followed by the removal of these layers and the formation of source and drain regions on opposite sides of the fin.
Career Highlights
Ouyang Hui is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to innovate in semiconductor fabrication techniques. His expertise in this field has positioned him as a valuable asset to the company.
Collaborations
Ouyang has collaborated with notable colleagues, including Matt Yeh and Fan-Yi Hsu. Their combined efforts contribute to advancements in semiconductor technology and innovation.
Conclusion
Ouyang Hui's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the industry. His innovative methods continue to shape the future of semiconductor fabrication.