Shiga, Japan

Osamu Sakai

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignees: The University of Shiga Prefecture, Tokyo Electron Limited. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Osamu Sakai. Retrieved from https://idiyas.com/inventor/osamu-sakai-bun3sup6

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Osamu Sakai: Innovator in Plasma Processing Technology

Introduction

Osamu Sakai is a notable inventor based in Shiga, Japan. He has made significant contributions to the field of plasma processing technology. His innovative work has led to the development of a unique plasma processing apparatus that enhances various industrial applications.

Latest Patents

Osamu Sakai holds a patent for a plasma processing apparatus. This apparatus comprises a processing chamber with a processing space, an electromagnetic wave generator for plasma excitation, and a dielectric with a first surface facing the processing space. The design includes an electromagnetic wave supply that delivers electromagnetic waves through the dielectric and a resonator array structure that resonates with magnetic field components of the electromagnetic waves. This resonator array is crucial for optimizing the processing capabilities of the apparatus.

Career Highlights

Throughout his career, Osamu Sakai has worked with prominent organizations, including Tokyo Electron Limited and the University of Shiga Prefecture. His experience in these institutions has allowed him to refine his expertise in plasma technology and contribute to advancements in the field.

Collaborations

(Section skipped due to space constraints.)

Conclusion

Osamu Sakai's contributions to plasma processing technology exemplify his innovative spirit and dedication to advancing industrial applications. His patent and career achievements highlight the importance of his work in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…