Company Filing History:
Years Active: 2002-2004
Title: Osamu Namba: Innovator in Photosolder Resist Compositions
Introduction
Osamu Namba is a notable inventor based in Takarazuka, Japan. He has made significant contributions to the field of photosolder resist compositions, holding a total of 2 patents. His work is characterized by innovative approaches to materials used in electronic applications.
Latest Patents
Namba's latest patents include a photosolder resist composition and an aqueous photosolder resist composition. The photosolder resist composition is distinguished by its unique formulation, which includes a resin with radical polymerization groups and carboxyl groups, an inorganic filler, and a photocurable mixture. The aqueous photosolder resist composition features an aqueous solution created by neutralizing a resin with a free-radically polymerizable group and a carboxyl group, along with similar components as the first patent.
Career Highlights
Osamu Namba is currently employed at Nippon Paint Company, Ltd., where he continues to develop innovative materials for various applications. His expertise in polymer chemistry and materials science has positioned him as a key figure in his field.
Collaborations
Namba has collaborated with notable colleagues such as Naoya Yabuuchi and Minoru Fujita. These partnerships have fostered a collaborative environment that enhances the development of new technologies.
Conclusion
Osamu Namba's contributions to the field of photosolder resist compositions demonstrate his innovative spirit and commitment to advancing technology. His work continues to influence the industry and pave the way for future developments.