The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 26, 2002

Filed:

Aug. 04, 2000
Applicant:
Inventors:

Naoya Yabuuchi, Toyonaka, JP;

Minoru Fujita, Ibaraki, JP;

Osamu Namba, Takarazuka, JP;

Keiichi Okajima, Osaka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/033 ; G03F 7/038 ;
U.S. Cl.
CPC ...
G03F 7/033 ; G03F 7/038 ;
Abstract

Disclosed are aqueous photosolder resist compositions containing (A) an aqueous solution prepared by neutralizing a resin containing a free-radically polymerizable group and a carboxyl group with a base; (B) an inorganic filler; (C) a photocurable mixture of (c-1) a multifunctional acrylic monomer, (c-2) a compound having a cyclic ether group other than a glycidyl group and (c-3) a photoinitiator; and optionally (D) an aqueous solution prepared by neutralizing a frege-radically polymerized substance having an acid value of 130-230 mgKOH/mg. The cyclic ether group other than a glycidyl group is an alicyclic epoxy or oxetane group, for example.


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