The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 27, 2004
Filed:
Nov. 16, 2001
Applicant:
Inventors:
Naoya Yabuuchi, Toyonaka, JP;
Minoru Fujita, Ibaraki, JP;
Osamu Namba, Takarazuka, JP;
Keiichi Okajima, Osaka, JP;
Assignee:
Nippon Paint Co., Ltd., Osaka, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/028 ; G03F 7/038 ; G03F 7/32 ; G03F 7/38 ; G03F 7/40 ;
U.S. Cl.
CPC ...
G03F 7/028 ; G03F 7/038 ; G03F 7/32 ; G03F 7/38 ; G03F 7/40 ;
Abstract
A photosolder resist composition of the invention is characterized by containing (A) a resin containing radical polymerization groups and carboxyl groups obtained by adding a cyclic ether group of a cyclic ether group-containing vinyl monomer to a carboxylic group of a radical copolymer containing at least isobornyl (meth) acrylate and a carboxyl group-containing vinyl monomer as monomer units; (B) an inorganic filler; and (C) a photocurable mixture of a polyfunctional acrylic monomer (c1), a cyclic ether group-containing compound (c2), and a photopolymerization initiator (c3).