Osamu Itoh

Title: Osamu Itoh: Innovator in Active Matrix Substrates

Introduction

Osamu Itoh is a notable inventor based in Kumamoto, Japan. He has made significant contributions to the field of active matrix substrates, holding a total of 2 patents. His work focuses on methods that enhance the functionality and efficiency of electronic devices.

Latest Patents

Osamu Itoh's latest patents include innovative methods for forming contact holes in active matrix substrates. One patent describes a method that involves depositing an insulating film over a first electrode and substrate, followed by dry etching to create a contact hole. This process is further refined by a surface treatment using plasma etching or reactive ion etching with oxygen gas. Another patent outlines a method for providing a contact hole that includes depositing a first conductive film, patterning it to form a first electrode line, and subsequently creating a contact hole in the insulating film. This method aims to lower the contact resistance of the contact hole through an oxidizing operation.

Career Highlights

Throughout his career, Osamu Itoh has worked with prominent companies such as Mitsubishi Electric Corporation and Advanced Display, Inc. His experience in these organizations has allowed him to develop and refine his innovative techniques in the field of electronics.

Collaborations

Osamu Itoh has collaborated with notable colleagues, including Shoichi Takanabe and Masashi Ura. These partnerships have contributed to the advancement of his research and the successful development of his patents.

Conclusion

Osamu Itoh's contributions to the field of active matrix substrates demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of electronic design and manufacturing processes. His work continues to influence the industry and pave the way for future advancements.