Mito, Japan

Osamu Ishii


Average Co-Inventor Count = 3.7

ph-index = 4

Forward Citations = 88(Granted Patents)


Location History:

  • Ibaragi, JP (1991)
  • Mito, JP (1985 - 1999)
  • Ibaraki, JP (1986 - 2002)

Company Filing History:


Years Active: 1985-2002

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9 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Osamu Ishii

Introduction

Osamu Ishii is a notable inventor based in Mito, Japan, recognized for his significant contributions to technology through his innovative patents. With a total of 9 patents to his name, Ishii has made strides in various fields, particularly in materials science and electromagnetic technology.

Latest Patents

Ishii's latest patents include a method for partially forming an oxide layer on a glass substrate. This method involves forming an oxide layer on the substrate's surface and then partially dissolving it using a paste that contains an inorganic compound, organic solvents, and silicon powder. This innovative approach allows for efficient and precise formation of oxide layers. Another significant patent is for an electromagnetic noise absorbing material and filter. This technology is designed to be small, lightweight, and effective against unwanted electromagnetic waves, particularly in the range of a few hundred MHz. The electromagnetic noise absorbing material is engineered to generate a large eddy current loss, enabling the creation of various shapes of electromagnetic noise filters that maintain a high level of performance.

Career Highlights

Throughout his career, Osamu Ishii has worked with prominent organizations, including Nippon Telegraph and Telephone Corporation and Nippon Telegraph and Telephone Public Corporation. His experience in these companies has contributed to his expertise in developing advanced technologies.

Collaborations

Ishii has collaborated with notable coworkers such as Iwao Hatakeyama and Masakatsu Senda, further enhancing his innovative capabilities and expanding his contributions to the field.

Conclusion

Osamu Ishii's work exemplifies the spirit of innovation and dedication to advancing technology. His patents reflect a commitment to solving complex problems and improving existing technologies. His contributions continue to influence the fields of materials science and electromagnetic technology.

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