The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 01, 1985

Filed:

Sep. 16, 1983
Applicant:
Inventors:

Osamu Ishii, Mito, JP;

Fumikatsu Yoshimura, Mito, JP;

Iwao Hatakeyama, Mito, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B32B / ;
U.S. Cl.
CPC ...
428692 ; 428702 ; 428900 ; 252 6256 ;
Abstract

.gamma.-Fe.sub.2 O.sub.3 film with at least one additive selected from the group consisting of Pd, Au, Pt, Rh, Ag, Ru, Ir, and Os, especially Os are disclosed. Reduction from .alpha.-Fe.sub.2 O.sub.3 to Fe.sub.3 O.sub.4 is accelerated by additive Os to achieve a uniform reduction and increase the ratio of magnetic phase in the film. .gamma.-Fe.sub.2 O.sub.3 film medium with Os improved saturation magnetization and increased coercive force in proportion to amount of additive Os. Application of an external field to said film introduces magnetic anisotropy into said film, therefore said film medium improves coercive force and squareness of hysteresis loop by the introduction of anisotropy. .gamma.-Fe.sub.2 O.sub.3 crystal grain is prepared by additive Os to obtain fine grain. The resultant .gamma.-Fe.sub.2 O.sub.3 film medium a decreased noise level.


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