This inventor holds 2 USPTO granted patents. Top assignees: Fujikin Inc., Tokyo Electron Limited, Other. Active years: 2000.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
2 out of 450 
2 out of 10,918 
2 out of 834,570 Years Active: 2000
Title: Osamu Fukada: Innovator in Flow Rate Control Technology
Introduction
Osamu Fukada is a notable inventor based in Osaka, Japan, known for his contributions to flow rate control technology. With two patents to his name, he has made significant advancements in the field, showcasing his expertise and innovative spirit.
Latest Patents
Among his latest inventions are the "Orifice for Pressure Type Flow Rate Control Unit" and the associated "Process for Orifice for Pressure Type Flow Rate Control Unit." These patents reflect his deep understanding of fluid dynamics and control mechanisms.
Career Highlights
Fukada has had a successful career, including significant roles at renowned companies such as Fujikin Inc. and Tokyo Electron Limited. His work has helped shape the development of various technologies in these esteemed organizations.
Collaborations
Throughout his career, Osamu has collaborated with talented professionals, including coworkers Tadahiro Ohmi and Tetu Kagazume. These collaborations have likely enriched his innovative endeavors and provided new insights into the challenges of flow rate control.
Conclusion
Osamu Fukada stands out as a prominent inventor in the field of flow rate technology. His patents and collaboration with industry leaders illustrate his commitment to advancing technology and innovation. As the industry continues to evolve, Fukada's contributions remain significant milestones in the journey toward improved flow rate control solutions.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile