Ibaraki, Japan

Osada Minoru

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Osada Minoru. Retrieved from https://idiyas.com/inventor/osada-minoru

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: The Innovations of Osada Minoru

Introduction

Osada Minoru is a notable inventor based in Ibaraki, Japan. He has made significant contributions to the field of semiconductor technology. His work primarily focuses on dielectric materials, which are essential for various electronic devices.

Latest Patents

Osada Minoru holds a patent for a dielectric monolayer thin film, along with a capacitor and semiconductor device that incorporate this innovative material. The patent describes a method for forming the dielectric monolayer thin film, which includes an oxide with a perovskite-type crystal structure. This oxide is chemically bonded with hydrogen, enhancing its properties for use in advanced electronic applications.

Career Highlights

Minoru is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of technology. His expertise in dielectric materials has positioned him as a key player in the development of next-generation electronic devices.

Collaborations

Throughout his career, Osada Minoru has collaborated with talented individuals such as Hyungjun Kim and Taniguchi Takaaki. These partnerships have fostered innovation and contributed to the success of various projects within the semiconductor industry.

Conclusion

Osada Minoru's contributions to the field of semiconductor technology, particularly through his patent on dielectric materials, highlight his role as an influential inventor. His work continues to impact the development of advanced electronic devices, showcasing the importance of innovation in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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