Netanya, Israel

Oriel Ben Shmuel

This inventor holds 1 USPTO granted patent. Top assignee: Kla Corporation. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Oriel Ben Shmuel. Retrieved from https://idiyas.com/inventor/oriel-ben-shmuel

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 13.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Oriel Ben Shmuel: Innovator in Context-Based Defect Inspection

Introduction

Oriel Ben Shmuel is a notable inventor based in Netanya, Israel. He has made significant contributions to the field of optical imaging and defect inspection. His innovative approach has led to the development of a unique patent that enhances the accuracy of inspection systems.

Latest Patents

Oriel holds a patent for a context-based defect inspection system. This system includes an optical imaging sub-system and is designed to improve the inspection process. It features one or more controllers that are communicatively coupled to the optical imaging system. The controllers are configured to receive reference images and test images of a sample. They generate probabilistic context maps during inspection runtime using an unsupervised classifier. These maps are then provided to a supervised classifier, which applies it to the test images to identify defects on the sample.

Career Highlights

Oriel is currently employed at Kla Corporation, where he continues to work on advancing inspection technologies. His expertise in optical imaging has positioned him as a key player in the development of innovative solutions in the industry.

Collaborations

Oriel collaborates with talented professionals such as Brian Duffy and Bradley Ries. Their combined efforts contribute to the success of projects at Kla Corporation.

Conclusion

Oriel Ben Shmuel is a distinguished inventor whose work in context-based defect inspection showcases his commitment to innovation. His contributions are paving the way for advancements in optical imaging technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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