Ori Petel

Title: The Innovative Contributions of Ori Petel

Introduction

Ori Petel is a notable inventor based in Ramat Gan, Israel. He has made significant contributions to the field of semiconductor technology, holding three patents that showcase his expertise and innovative spirit. His work primarily focuses on mask inspection systems, which are crucial for ensuring the quality and reliability of semiconductor manufacturing.

Latest Patents

Ori Petel's latest patents revolve around advanced methods for mask inspection of semiconductor specimens. One of his notable inventions involves a mask inspection system that detects runtime defects on a semiconductor mask during a scan. The method includes acquiring multiple sets of aerial images corresponding to various focus states and calculating statistic-based Edge Positioning Displacement (EPD) values to determine the authenticity of defects. This innovative approach enhances the accuracy of defect detection and classification, thereby improving the overall quality control in semiconductor production.

Career Highlights

Ori Petel is currently employed at Applied Materials Israel Limited, a leading company in the semiconductor industry. His role involves developing cutting-edge technologies that contribute to the efficiency and effectiveness of semiconductor manufacturing processes. His expertise in mask inspection systems has positioned him as a key player in the field.

Collaborations

Ori has collaborated with talented individuals such as Boaz Cohen and Ariel Shkalim. These collaborations have fostered a creative environment that encourages innovation and the development of advanced technologies in the semiconductor sector.

Conclusion

Ori Petel's contributions to semiconductor technology through his innovative patents and collaborative efforts highlight his importance in the field. His work continues to influence the industry, ensuring higher standards in semiconductor manufacturing.