Rehovot, Israel

Orel Bat Mor

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials Israel Limited. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Orel Bat Mor. Retrieved from https://idiyas.com/inventor/orel-bat-mor-0yi0wx0d

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Orel Bat Mor: Innovator in Semiconductor Technology

Introduction

Orel Bat Mor is a notable inventor based in Rehovot, Israel. He has made significant contributions to the field of semiconductor technology. His work focuses on systems and methods that enhance the registration between images informative of semiconductor specimens.

Latest Patents

Orel Bat Mor holds a patent titled "Systems and Methods for Registration Between Images Informative of One or More Semiconductor Specimens." This patent showcases his innovative approach to improving image registration in semiconductor applications. He has 1 patent to his name, reflecting his expertise and dedication to advancing technology in this area.

Career Highlights

Orel Bat Mor is currently employed at Applied Materials Israel Limited, a leading company in the semiconductor industry. His role involves developing cutting-edge technologies that contribute to the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Orel collaborates with Yan Avniel, a fellow innovator in the field. Together, they work on projects that aim to push the boundaries of semiconductor technology and improve the overall quality of semiconductor specimens.

Conclusion

Orel Bat Mor's contributions to semiconductor technology through his patent and work at Applied Materials Israel Limited highlight his role as an influential inventor in the industry. His innovative spirit continues to drive advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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