Rapotin, Czechia

Ondrej Zindulka

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Pivot A.s.. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ondrej Zindulka. Retrieved from https://idiyas.com/inventor/ondrej-zindulka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: Ondrej Zindulka: Innovator in Magnetron Sputtering Technology

Introduction

Ondrej Zindulka is a notable inventor based in Rapotin, Czech Republic. He has made significant contributions to the field of magnetron sputtering technology. His innovative approach has led to the development of a unique patent that enhances the control of reactive magnetron sputtering processes.

Latest Patents

Zindulka holds a patent for a magnetron sputtering process. This invention focuses on controlling the reactive magnetron sputtering process using reactive gases. The overall pressure of the process is regulated by adjusting the flow of these gases. Additionally, oscillations in the flow are utilized as feedback to determine the overall pressure of the process.

Career Highlights

Zindulka is currently employed at Pivot A.S., where he continues to advance his research and development efforts. His work at the company has allowed him to explore innovative solutions in the field of materials science and engineering.

Collaborations

Zindulka collaborates with his coworker, Mojmir Jilek, to further enhance their research initiatives. Together, they aim to push the boundaries of technology in their respective fields.

Conclusion

Ondrej Zindulka's contributions to magnetron sputtering technology exemplify the spirit of innovation. His patent and ongoing work at Pivot A.S. highlight his commitment to advancing scientific knowledge and practical applications in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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