The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 2015
Filed:
Dec. 31, 2011
Applicants:
Ondrej Zindulka, Rapotin, CZ;
Mojmir Jilek, Sumperk, CZ;
Inventors:
Ondrej Zindulka, Rapotin, CZ;
Mojmir Jilek, Sumperk, CZ;
Assignee:
Pivot A.S., , CZ;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/00 (2006.01); C23C 14/35 (2006.01); H01J 37/34 (2006.01);
U.S. Cl.
CPC ...
C23C 14/0042 (2013.01); C23C 14/35 (2013.01); H01J 37/3405 (2013.01);
Abstract
To control reactive magnetron sputtering process using a reactive gas or reactive gases the process overall pressure is regulated by means of the flow of the reactive gas or the reactive gases, respectively. Oscillations of the flow of the reactive gas or the reactive gases, respectively are determined and used as feedback to determine the process overall pressure.