Brno, Czechia

Ondrej Klvac

This inventor holds 1 USPTO granted patent and 2 published patent applications and 1 EPO patent. Top assignee: Fei Comapny. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ondrej Klvac. Retrieved from https://idiyas.com/inventor/ondrej-klvac

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Ondrej Klvac: Innovator in Sample Processing Technology

Introduction

Ondrej Klvac is a notable inventor based in Brno, Czech Republic. He has made significant contributions to the field of sample processing technology, particularly through his innovative patent that enhances the efficiency of handling multiple samples.

Latest Patents

Klvac holds a patent titled "Systems and methods for pre-aligning samples for more efficient processing of multiple samples with a Broad Ion Beam (BIB) system." This invention involves affixing a sample to an adjustable portion of a sample holder and aligning it with a first mask positioned outside of a BIB system. The method ensures that the sample maintains a desired geometric relationship with the mask edges, facilitating improved processing efficiency.

Career Highlights

Klvac is currently employed at FEI Company, where he applies his expertise in sample processing technologies. His work has been instrumental in advancing the capabilities of BIB systems, contributing to more effective sample analysis.

Collaborations

Klvac collaborates with talented colleagues, including Michal Hrouzek and Libor Novak, who share his commitment to innovation in the field.

Conclusion

Ondrej Klvac's contributions to sample processing technology through his patent demonstrate his dedication to improving efficiency in scientific research. His work at FEI Company and collaborations with fellow innovators further highlight his impact in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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