Hillsboro, OR, United States of America

Omkar S Dandekar

USPTO Granted Patents = 4 

Average Co-Inventor Count = 2.8

ph-index = 1

Forward Citations = 67(Granted Patents)


Location History:

  • Baltimore, MD (US) (2013)
  • Hillsboro, OR (US) (2012 - 2016)

Company Filing History:


Years Active: 2012-2016

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4 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Omkar S Dandekar

Introduction

Omkar S Dandekar is a notable inventor based in Hillsboro, Oregon. He has made significant contributions to the field of photolithography, holding a total of four patents. His work focuses on enhancing the efficiency and effectiveness of mask designs used in semiconductor manufacturing.

Latest Patents

Dandekar's latest patents include innovative techniques for photolithography mask synthesis. One of his patents, titled "Photolithography mask synthesis for spacer patterning," discloses a method for creating spacer patterning masks. In this process, backbone features are extracted from a target layout of a mask design. A connectivity graph is generated, where lines of the backbone features are represented as nodes. These nodes are connected based on spacer patterning process limitations, and the connections are assigned to sets. A backbone mask layout is then generated based on one of these sets of nodes. Another significant patent is "Photolithography mask design simplification," which focuses on optimizing a target mask design for photolithography. This involves identifying medial axes of the design and assist features, simplifying them to lines, and pruning distant lines. The remaining lines are then thickened to form assist features.

Career Highlights

Throughout his career, Dandekar has worked with prominent organizations, including the University System of Maryland and Intel Corporation. His experience in these institutions has allowed him to develop and refine his innovative techniques in photolithography.

Collaborations

Dandekar has collaborated with notable colleagues such as Raj Shekhar and Vivek K Singh. Their combined expertise has contributed to the advancement of technologies in the semiconductor industry.

Conclusion

Omkar S Dandekar's contributions to photolithography and mask design have significantly impacted the semiconductor manufacturing process. His innovative patents and collaborations highlight his role as a leading inventor in this field.

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