The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 23, 2016
Filed:
Dec. 29, 2011
Bikram Baidya, Hillsboro, OR (US);
Omkar S. Dandekar, Hillsboro, OR (US);
Vivek K. Singh, Portland, OR (US);
Bikram Baidya, Hillsboro, OR (US);
Omkar S. Dandekar, Hillsboro, OR (US);
Vivek K. Singh, Portland, OR (US);
Intel Corporation, Santa Clara, CA (US);
Abstract
Photolithography mask synthesis is disclosed for spacer patterning masks. In one example, backbone features are extracted from a target layout of a mask design. A connectivity graph is generated based on the target layout in which lines of the backbone features are represented as nodes on the connectivity graph. The nodes are connected based on spacer patterning process limitations and the connections are assigned to sets. A backbone mask layout is then generated based on one of the sets of nodes.