This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignees: Asm America, Inc., Beneq Oy. Active years: 2006-2014.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2006-2014
Title: Olli Jylhä: Innovator in Structural Modules and Semiconductor Processing
Introduction
Olli Jylhä is a notable inventor based in Espoo, Finland. He has made significant contributions to the fields of structural modules and semiconductor processing. With a total of 2 patents, Jylhä's work showcases his innovative approach to engineering and technology.
Latest Patents
Jylhä's latest patents include a "Strengthened Structural Module and Method of Fabrication" and a "Reduced Cross-Contamination Between Chambers in a Semiconductor Processing Tool." The strengthened structural module comprises an essentially planar glass substrate, a second substrate, and at least one spacer element that maintains separation between the two substrates. This design enhances the module's strength through a conformal coating applied to the outer surfaces. The method for reducing cross-contamination involves a sophisticated process of vacuum pumping and inert gas flow, ensuring a definitive flow direction that minimizes the risk of back-diffusion during workpiece transfer.
Career Highlights
Throughout his career, Olli Jylhä has worked with prominent companies such as Asm America, Inc. and Beneq Oy. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking innovations in his field.
Collaborations
Jylhä has collaborated with notable professionals, including Christophe F Pomarede and Eric James Shero. These partnerships have further enriched his work and expanded the impact of his inventions.
Conclusion
Olli Jylhä's contributions to the fields of structural engineering and semiconductor processing highlight his innovative spirit and dedication to advancing technology. His patents reflect a commitment to improving efficiency and effectiveness in these critical areas.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

