Paris, France

Olivier Dalstein

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignees: Centre National De La Recherche Scientifique, Sorbonne Université, Université Paris-Saclay. Active years: 2025.


% Patents Active = 100.0

 

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Olivier Dalstein: Innovator in Nanoimprint Lithography

Introduction

Olivier Dalstein is a notable inventor based in Paris, France. He has made significant contributions to the field of nanoimprint lithography, particularly through his innovative processes and techniques. His work has implications for various applications in materials science and nanotechnology.

Latest Patents

Olivier Dalstein holds a patent for a "Nanoimprint lithography process and patterned substrate obtainable therefrom." This invention pertains to the field of nanoimprint lithography (NIL) processes, specifically focusing on a soft NIL process used to provide a sol-gel patterned layer on a substrate. The process involves adjusting the solvent uptake of the sol-gel film to between 10 to 50% vol., preferably between 15 and 40% vol., by varying the relative pressure of the solvent while a soft mold is applied onto the substrate coated with the sol-gel film. He has 1 patent to his name.

Career Highlights

Throughout his career, Olivier has worked with prestigious institutions such as the Centre National de la Recherche Scientifique and Université Paris-Saclay. His experience in these organizations has allowed him to develop and refine his expertise in nanoimprint lithography.

Collaborations

Olivier has collaborated with notable colleagues, including Marco Faustini and David Grosso. These partnerships have contributed to the advancement of research and innovation in his field.

Conclusion

Olivier Dalstein is a prominent figure in the realm of nanoimprint lithography, with a focus on innovative processes that enhance material applications. His contributions and collaborations continue to influence the field significantly.

Profile summary based on public USPTO records.
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