The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 04, 2025
Filed:
Mar. 08, 2018
Universite D'aix-marseille, Marseilles, FR;
Centre National DE LA Recherche Scientifique, Paris, FR;
Sorbonne Universite, Paris, FR;
Universite Paris-saclay, Gif-sur-Yvette, FR;
David Grosso, Allauch, FR;
Marco Faustini, Paris, FR;
Olivier Dalstein, Paris, FR;
Andréa Cattoni, Rosate, IT;
Thomas Bottein, Talence, FR;
UNIVERSITE D'AIX-MARSEILLE, Marseilles, FR;
CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE, Paris, FR;
SORBONNE UNIVERSITE, Paris, FR;
UNIVERSITE PARIS-SACLAY, Gif-sur-Yvette, FR;
Abstract
The present invention pertains to the field of nanoimprint lithography (NIL) processes and more specifically to a soft NIL process used for providing a sol-gel patterned layer on a substrate. Specifically, this process comprises a step of adjusting the solvent uptake of the sol-gel film to 10 to 50% vol., preferably between 15 and 40% vol., by varying the relative pressure of the solvent while a soft mould is applied onto the substrate coated with the sol-gel film.