Oleg Glushenkov

Title: Oleg Glushenkov: Innovator in High Density Plasma Oxidation

Introduction

Oleg Glushenkov is a notable inventor based in Wappingers Falls, NY (US). He has made significant contributions to the field of materials science, particularly in the area of high density plasma oxidation. His innovative methods have implications for various applications in semiconductor manufacturing and materials processing.

Latest Patents

Oleg Glushenkov holds a patent for a method of oxidizing a substrate with an area of about 30,000 mm or more. This method involves the use of silicon-containing materials, such as silicon, silicon germanium, silicon carbide, silicon nitride, and metal suicides. The process utilizes a mixture of oxygen-bearing gas and a diluent gas, which is typically non-reactive to oxygen, such as Ne, Ar, Kr, Xe, and/or Rn. These gases are ionized to create a plasma with an electron density of at least about 1e12 cm and containing ambient electrons with an average temperature greater than about 1 eV. The substrate surface is oxidized using energetic particles, primarily atomic oxygen, generated in the plasma to form an oxide film of substantially uniform thickness. Notably, this oxidation occurs at temperatures below about 700°C, typically ranging from room temperature (20°C) to about 500°C.

Career Highlights

Throughout his career, Oleg Glushenkov has worked with prominent companies in the technology sector. He has been associated with Infineon Technologies North America Corp. and International Business Machines Corporation (IBM). His work in these organizations has allowed him to develop and refine his innovative techniques in plasma oxidation.

Collaborations

Oleg has collaborated with several professionals in his field, including Andreas Knorr and Michael P. Belyansky. These collaborations have contributed to the advancement of his research and the successful implementation of his patented methods.

Conclusion

Oleg Glushenkov is a distinguished inventor whose work in high density plasma oxidation has paved the way for advancements in materials science. His innovative methods and collaborations with industry leaders highlight his significant contributions to the field.