This inventor holds 2 USPTO granted patents and 1 published patent application and 2 EPO patents. Top assignees: Ihp Gmbh - Innovations for High Performance Microelectronics, Wacker Chemie Ag. Active years: 2014-2022.
Company Filing History:
1 out of 13 
1 out of 844 
Years Active: 2014-2022
Title: The Innovative Contributions of Olaf Seifarth
Introduction
Olaf Seifarth is a notable inventor based in Burghausen, Germany. He has made significant contributions to the field of microelectronics and graphene technology. With a total of 2 patents, his work reflects a commitment to advancing technological innovation.
Latest Patents
Seifarth's latest patents include a method for determining surface temperature in a Siemens process. This innovative approach controls rod growth by measuring rod diameter and temperature through two distinct measuring systems located outside the reactor. Another significant patent involves the fabrication of graphene electronic devices using a step surface contour. This method outlines the process of providing a substrate, depositing a graphene layer, and ensuring that the substrate is either pre-equipped with a van-der-Waals functional layer or has one deposited before the graphene layer. This technique allows for the formation of a surface step contour, which is crucial for seeding the growth of the graphene layer.
Career Highlights
Throughout his career, Olaf Seifarth has worked with prominent companies such as IHP GmbH, which focuses on innovations for high-performance microelectronics, and Wacker Chemie AG. His experience in these organizations has contributed to his expertise in the field.
Collaborations
Seifarth has collaborated with notable colleagues, including Markus Wenzeis and Gunther Lippert. These partnerships have likely enhanced his innovative capabilities and broadened his impact in the industry.
Conclusion
Olaf Seifarth's contributions to the fields of microelectronics and graphene technology demonstrate his innovative spirit and dedication to advancing scientific knowledge. His patents and collaborations reflect a career marked by significant achievements and a commitment to excellence.