This inventor holds 3 USPTO granted patents and 1 published patent application and 1 EPO patent. Top assignee: Rohde and Schwarz Gmbh & Co. Kg. Active years: 2000-2019.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2000-2019
Title: The Innovations of Olaf Ostwald
Introduction
Olaf Ostwald is a notable inventor based in Munich, Germany. He has made significant contributions to the field of microwave technology, holding a total of 3 patents. His work focuses on systems and methods for scanning objects and detecting dielectric materials, showcasing his expertise in innovative solutions.
Latest Patents
Ostwald's latest patents include a "System and a method for the efficient scanning of objects." This invention relates to the use of microwave radiation for scanning individuals, particularly in security settings. The system features an arrangement of several panels that create an angled walk-through passage. Another significant patent is the "Method for detecting a covered dielectric object." This method involves generating a modifiable microwave signal that is transmitted towards a covered dielectric object. The reflected microwave signal is analyzed to detect the object based on specific signal amplitude patterns.
Career Highlights
Throughout his career, Olaf Ostwald has worked with prominent organizations such as Rohde & Schwarz GmbH & Co. KG and Friedrich-Alexander-Universität Erlangen-Nürnberg. His experience in these companies has allowed him to develop and refine his innovative ideas in microwave technology.
Collaborations
Ostwald has collaborated with talented individuals in his field, including Sherif Sayed Ahmed and Christian Evers. These partnerships have contributed to the advancement of his research and inventions.
Conclusion
Olaf Ostwald's contributions to microwave technology and his innovative patents highlight his role as a significant inventor in the field. His work continues to influence advancements in scanning and detection methods.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
