Company Filing History:
Years Active: 2003-2004
Title: Ok-Seok Jang: Innovator in Photoresist Technology
Introduction
Ok-Seok Jang is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of photoresist technology, holding a total of 2 patents. His work focuses on developing effective compositions for stripping photoresists, which are crucial in various manufacturing processes.
Latest Patents
Jang's latest patents include a thinner composition and a method for stripping photoresist using the same. The thinner composition is effective in removing a variety of photoresists and includes propylene glycol mono-methyl ether acetate, ethyl 3-ethoxy propionate, and at least one of γ-butyrolactone and propylene glycol mono-methyl ether. This composition can selectively strip photoresist coated on the backside and edge portions of a substrate, as well as on the entire front surface. Additionally, he has developed a photoresist stripper composition made up of a mixture of an acetic acid ester, γ-butyrolactone (GBL), and a non-acetate ester or a poly alkyl alcohol derivative. The acetic acid ester may include n-butyl acetate, amyl acetate, ethyl aceto-acetate, and isopropyl acetate, while the non-acetate ester may consist of ethyl lactate, ethyl-3-ethoxy propionate, and methyl-3-methoxy. The poly alkyl alcohol derivative may include propylene glycol monomethyl ester and propylene glycol monomethyl ester acetate.
Career Highlights
Ok-Seok Jang is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate in the field of photoresist technology. His work has been instrumental in enhancing the efficiency and effectiveness of photoresist stripping processes.
Collaborations
Throughout his career, Jang has collaborated with notable colleagues, including Seung-Hyun Ahn and Sang-Mun Chon. These collaborations have contributed to the advancement of technology in their field.
Conclusion
Ok-Seok Jang is a prominent inventor whose work in photoresist technology has led to significant advancements in the industry. His innovative patents and contributions continue to impact the field positively.
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