Ohm-Guo Pan

Title: The Innovative Journey of Ohm-Guo Pan

Introduction

Ohm-Guo Pan, based in Portland, OR, is a notable inventor with a focus on semiconductor technology. With a total of two patents to his name, Pan has made significant contributions to the field, particularly in developing methods to enhance semiconductor manufacturing processes.

Latest Patents

Ohm-Guo Pan's latest patents reflect his expertise in semiconductor innovations. The first patent, titled "Dielectric anti-reflective coating surface treatment to prevent defect generation in associated wet clean," describes a method to prevent watermark defects during the wet cleaning process of semiconductor substrates. This method involves creating a pad oxide, layering silicon nitride and silicon oxynitride, and using a photoresist mask to form trenches in the substrate. Notably, the conditioned silicon oxynitride layer plays a crucial role in preventing watermark formation.

His second patent, "Method of forming an oxide layer," focuses on the process of forming nitrided oxides in semiconductor devices through rapid thermal oxidation. This process includes heating a semiconductor substrate with an exposed silicon surface in a process chamber filled with an ambient gas mixture that includes N2O and an inert gas. The results yield an ultra-thin oxide layer with enhanced characteristics, such as improved boron penetration resistance and uniform oxide thickness.

Career Highlights

Ohm-Guo Pan currently works at Integrated Device Technology, Inc., where he continues to innovate within the semiconductor industry. His work focuses on advancing techniques that improve the manufacturing of semiconductors, contributing to the overall growth of the technology landscape.

Collaborations

Throughout his career, Ohm-Guo Pan has collaborated with talented professionals such as Shih-Ked Lee and Guo-Qiang Lo. These collaborations have fostered a productive environment leading to breakthrough innovations and patented technologies.

Conclusion

Ohm-Guo Pan's contributions to the field of semiconductor manufacturing demonstrate his commitment to innovation and excellence. Through his patents and collaborations, he continues to push the boundaries of technology, making a lasting impact in his industry. His work not only improves manufacturing processes but also inspires future advancements in semiconductor design and applications.