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Years Active: 2010-2011
Title: Oh Jung Kwon: Innovator in Semiconductor Technology
Introduction
Oh Jung Kwon is a notable inventor based in Hopewell Junction, NY (US). He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on enhancing the performance and efficiency of integrated circuit devices.
Latest Patents
One of his latest patents is titled "Method of forming field effect transistors using diluted hydrofluoric acid to remove sacrificial nitride spacers." This invention involves a method for creating field effect transistors that utilize sacrificial nitride spacers and source/drain regions that are self-aligned. The selective removal of these spacers using a diluted hydrofluoric acid solution enhances the charge carrier mobility within the transistor's channel. Another significant patent is related to "Semiconductor devices having recesses filled with semiconductor materials." This patent describes a method for manufacturing semiconductor devices that includes forming a recess in a workpiece and filling it with different semiconductive materials, optimizing the device's performance.
Career Highlights
Throughout his career, Oh Jung Kwon has worked with leading companies in the semiconductor industry, including Samsung Electronics Co., Ltd. and Infineon Technologies AG. His experience in these organizations has contributed to his expertise in semiconductor device fabrication and innovation.
Collaborations
Oh Jung Kwon has collaborated with notable colleagues such as O Sung Kwon and Sang Jine Park. Their combined efforts have further advanced the field of semiconductor technology.
Conclusion
Oh Jung Kwon's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the industry. His innovative methods continue to shape the future of integrated circuit devices.