Company Filing History:
Years Active: 2018
Title: Ofir Aharon: Innovator in Scatterometry Overlay Measurement
Introduction
Ofir Aharon is a notable inventor based in Yokneam Eililit, Israel. He has made significant contributions to the field of scatterometry overlay measurement, particularly through his innovative patent. His work is essential for enhancing the precision of optical measurements in various applications.
Latest Patents
Ofir Aharon holds a patent titled "Pupil plane calibration for scatterometry overlay measurement." This patent involves methods and calibration modules designed to calibrate a pupil center in scatterometry overlay measurements. The calibration process includes calculating fluctuations from a first statistical figure of merit, such as the average of an overlay signal per pixel at the pupil. It significantly reduces fluctuations with respect to a second statistical figure of merit, such as a pupil weighted variance of the fluctuations. This innovation is crucial for improving measurement accuracy in advanced optical systems.
Career Highlights
Ofir Aharon is currently employed at KLA-Tencor Corporation, a leading company in the semiconductor industry. His role involves applying his expertise in optical measurement technologies to develop solutions that enhance manufacturing processes. His contributions have been instrumental in advancing the capabilities of the company's measurement systems.
Collaborations
Ofir has collaborated with talented professionals in his field, including Barak Bringoltz and Irina Vakshtein. These collaborations have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.
Conclusion
Ofir Aharon's work in scatterometry overlay measurement exemplifies the impact of innovative thinking in the semiconductor industry. His patent and contributions to KLA-Tencor Corporation highlight his commitment to advancing measurement technologies.