Ganey Yohanan, Israel

Ofer Dudovitch

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials Israel Limited. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ofer Dudovitch. Retrieved from https://idiyas.com/inventor/ofer-dudovitch-6zx8zdht

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Ofer Dudovitch: Innovator in Vacuum Chamber Technology

Introduction

Ofer Dudovitch is a notable inventor based in Ganey Yohanan, Israel. He has made significant contributions to the field of vacuum chamber technology, particularly with his innovative designs that enhance the processing of samples.

Latest Patents

Dudovitch holds a patent for a "Moveable support to secure electrically conductive and nonconductive samples in a vacuum chamber." This invention features a chuck that supports a sample in a processing chamber. It includes a support plate made from a dielectric material, which has an upper planar support surface designed to retain a substrate. The design incorporates one or more electrodes, lift pin holes, stub cavities, retractable stubs, and a stub lift mechanism that allows for precise movement of the stubs.

Career Highlights

Ofer Dudovitch is currently associated with Applied Materials Israel Limited, where he applies his expertise in developing advanced technologies for the semiconductor industry. His work focuses on improving the efficiency and effectiveness of sample processing in vacuum environments.

Collaborations

Due to space constraints, the details of collaborations will not be included.

Conclusion

Ofer Dudovitch's innovative contributions to vacuum chamber technology exemplify the impact of dedicated inventors in advancing industrial processes. His patent reflects a commitment to enhancing the capabilities of sample processing, showcasing the importance of innovation in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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