Noémie Blanc

Title: Noémie Blanc: Innovator in Semiconductor Technology

Introduction

Noémie Blanc is a prominent inventor based in Pourrieres, France. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on innovative methods for fabricating semiconductor regions in electronic chips.

Latest Patents

Noémie Blanc's latest patents include a method for the production of semiconductor regions in an electronic chip. This method involves fabricating first and second semiconductor regions that are separated by isolating trenches. The process begins with covering a semiconductor substrate with silicon nitride. The silicon nitride above the first region is then doped through ion implantation. Following this, trenches are etched through the silicon nitride, and the doped silicon nitride is partially etched in an isotropic manner. The trenches are subsequently filled with an insulator to a level above that of the first region. Finally, the silicon nitride is removed, resulting in the edges of the first region being covered with an insulator annulus.

Career Highlights

Noémie Blanc is currently employed at STMicroelectronics (Rousset) SAS, where he continues to advance his research and development in semiconductor technologies. His innovative approaches have positioned him as a key player in the industry.

Collaborations

He collaborates with notable coworkers such as Franck Julien and Frédéric Chairat, contributing to a dynamic team focused on cutting-edge technology.

Conclusion

Noémie Blanc's contributions to semiconductor technology through his patents and work at STMicroelectronics highlight his role as an influential inventor in the field. His innovative methods are paving the way for advancements in electronic chip fabrication.