This inventor holds 4 USPTO granted patents and 1 published patent application. Top assignees: Lam Research Corporation, Other. Active years: 2010-2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:

Years Active: 2010-2025
Title: Innovations of Norman Mertke
Introduction
Norman Mertke is a notable inventor based in San Jose, CA (US). He has made significant contributions to the field of substrate processing systems, holding a total of 4 patents. His work focuses on enhancing the efficiency and effectiveness of temperature control in substrate treatment processes.
Latest Patents
One of Mertke's latest patents is titled "Temperature-tuned substrate support for substrate processing systems." This innovative system is designed to control the temperature of a substrate during treatment. It comprises a substrate support with first and second components, each equipped with heaters and heat sinks. The first component features an upper surface that partially defines a center zone, while the second component is positioned radially outside and below the first. The design allows for a temperature difference of greater than 10°C between the center zone and the radially-outer zone during treatment, optimizing the substrate processing.
Career Highlights
Throughout his career, Norman Mertke has worked with various companies, including Lam Research Corporation. His experience in the industry has allowed him to develop innovative solutions that address complex challenges in substrate processing.
Collaborations
Mertke has collaborated with several professionals in his field, including Himanshu Chokshi and Alan Scott Gazaway. These collaborations have contributed to the advancement of technology in substrate processing systems.
Conclusion
Norman Mertke's contributions to substrate processing technology through his patents and collaborations highlight his role as an influential inventor. His innovative approaches continue to impact the industry positively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile