Location History:
- Hiratsuka, JP (1997)
- Kanagawa-ken, JP (1998)
Company Filing History:
Years Active: 1997-1998
Title: Noriyuki Uemura: Innovator in Epitaxial Wafer Technology
Introduction
Noriyuki Uemura is a prominent inventor based in Hiratsuka, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the fabrication of epitaxial wafers. With a total of 2 patents to his name, Uemura's work has been instrumental in improving the quality and efficiency of electronic devices.
Latest Patents
Uemura's latest patents focus on methods for fabricating high-quality epitaxial wafers. One of his notable inventions is a method that reduces the density of microscopic defects in the epitaxial layer, which helps maintain a high figure of merit (GOI) and minimizes leakage current at the P-N junction. This innovation ultimately enhances the yield of devices that incorporate these wafers. Another patent details an epitaxial wafer capable of removing impurities and oxide layers, featuring a substrate with a high density of laser-scattering centers. This design ensures a clean surface for epitaxial growth, which is crucial for the performance of electronic devices.
Career Highlights
Uemura is currently associated with Komatsu Electronic Metals Co., Ltd., where he continues to advance his research and development efforts. His work has garnered attention in the semiconductor industry, and he is recognized for his innovative approaches to wafer fabrication.
Collaborations
Uemura has collaborated with notable colleagues, including Hisami Motoura and Masashi Nishimura. Their combined expertise has contributed to the success of various projects and patents in the field of semiconductor technology.
Conclusion
Noriyuki Uemura's contributions to epitaxial wafer technology have made a significant impact on the semiconductor industry. His innovative patents and collaborations highlight his dedication to advancing electronic device performance.