Toyama, Japan

Noriyuki Takakura


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: Noriyuki Takakura: Innovator in Semiconductor Polishing Composition

Introduction

Noriyuki Takakura is a prominent inventor based in Toyama, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the development of polishing compositions. His innovative work has led to the creation of a patented method that enhances the production of semiconductor devices.

Latest Patents

Takakura holds a patent for a production method of polishing composition. This method involves producing a polishing composition containing zirconium oxide sol and planarizing a substrate with an uneven surface. The process includes baking a zirconium compound at temperatures ranging from 400 to 1000°C and wet-grinding the resulting zirconium oxide powder in an aqueous medium. This meticulous approach results in zirconium oxide particles with specific size distributions, crucial for effective semiconductor manufacturing.

Career Highlights

Noriyuki Takakura is associated with Nissan Chemical Industries Limited, where he has applied his expertise in materials science to advance semiconductor technologies. His work has not only contributed to the company's innovation portfolio but has also positioned him as a key figure in the industry.

Collaborations

Throughout his career, Takakura has collaborated with notable colleagues, including Isao Ota and Kenji Tanimoto. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and enhances the development of innovative solutions in semiconductor technology.

Conclusion

Noriyuki Takakura's contributions to the field of semiconductor polishing compositions exemplify the impact of innovation in technology. His patented methods and collaborative efforts continue to influence advancements in semiconductor manufacturing.

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