Noriyoshi Matsumoto

Title: Noriyoshi Matsumoto: Innovator in Projection Exposure Technology

Introduction

Noriyoshi Matsumoto is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of projection exposure technology, holding a total of 3 patents. His work focuses on enhancing the precision and efficiency of optical systems used in various applications.

Latest Patents

Matsumoto's latest patents include a projection exposure device and a position alignment device and method. In his innovative approach, a mask mark is irradiated by an ultra-violet light source. The image of the mark is then passed through a lens and a half-mirror, reflected by a mirror, and further passed through a beam splitter and a lens, ultimately forming an image on a CCD. The center coordinate of this image is measured by a device. Subsequently, a board mark is illuminated by an infrared light source, and its image follows a similar path through the optical system, forming an image on another CCD. The positional alignment is achieved by moving the mobile stage in the XYθ directions based on the board mark on the infrared CCD and the mask mark on the ultra-violet CCD.

Career Highlights

Matsumoto is currently employed at Adtec Engineering Co., Ltd., where he continues to develop cutting-edge technologies. His work has been instrumental in advancing the capabilities of projection exposure systems, which are critical in various manufacturing processes.

Collaborations

Throughout his career, Matsumoto has collaborated with notable colleagues, including Youichi Hirabayashi and Nozomu Kowatari. These partnerships have fostered innovation and contributed to the success of their projects.

Conclusion

Noriyoshi Matsumoto's contributions to projection exposure technology exemplify his dedication to innovation and excellence. His patents reflect a deep understanding of optical systems and their applications in modern technology.