The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 09, 2005

Filed:

Apr. 16, 2003
Applicants:

Youichi Hirabayashi, Tokyo, JP;

Noriyoshi Matsumoto, Tokyo, JP;

Inventors:

Youichi Hirabayashi, Tokyo, JP;

Noriyoshi Matsumoto, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B011/00 ; G03B027/42 ; G03B027/32 ; G06K009/00 ;
U.S. Cl.
CPC ...
Abstract

A mask mark is irradiated by an ultra-violet light source, thereby the image of the mark is passed through a lens and a half-mirror, then reflected by a mirror, thereafter further passed through a beam splitter and a lens, forming an image on a CCD. Then the center coordinate of the image is measured by a device, next, a board mark is illuminated by an infrared light source, and its image is passed through the mirror, the half-mirror, the beam splitter, a reflector, a lens, and a beam splitter, forming an image on a CCD. The positional alignment is implemented by moving the mobile stage in the XYθ directions based on the board mark on the infrared CCD and the mask mark on the ultra-violet CCD.


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