Noriyo Kimura

Title: Noriyo Kimura: Innovator in Photosensitive Resin Technology

Introduction

Noriyo Kimura is a prominent inventor based in Hitachi, Japan. He has made significant contributions to the field of photosensitive resin technology, holding a total of 5 patents. His work has been instrumental in advancing methods related to printed wiring boards and resist pattern formation.

Latest Patents

Kimura's latest patents include a photosensitive resin composition and a resist pattern forming method. The photosensitive resin composition comprises a binder polymer, a photopolymerizing compound with ethylenic unsaturated bonds, and a photopolymerization initiator. Notably, the binder polymer consists of two or more polymers and has a dispersity of 2.5-6.0. Additionally, the photopolymerizing compound features both ethylene glycol and C-Calkylene glycol chains. Another significant patent involves a laminate film designed for printed wiring board fabrication, which includes a photosensitive layer and specific elongation properties.

Career Highlights

Throughout his career, Noriyo Kimura has worked with notable companies such as Hitachi Chemical Company, Ltd. and Teijin Limited. His experience in these organizations has allowed him to develop innovative solutions in the field of materials science.

Collaborations

Kimura has collaborated with esteemed colleagues, including Youji Tanaka and Kazutaka Masaoka. Their joint efforts have contributed to the advancement of technology in their respective fields.

Conclusion

Noriyo Kimura's contributions to photosensitive resin technology and printed wiring board fabrication have established him as a key figure in innovation. His patents reflect a commitment to advancing materials science and engineering.